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Horizontal plasma cleaning equipment

It can be used for surface cleaning, activation, or modification of various substrates prior to printing or bonding

Introductions

Application Areas

Remove organic contaminants

Clean metal bonding pads

Improve wafer bonding adhesion

Enhance film adhesion

Remove metal oxides

Product Features

The unique chamber design ensures excellent uniformity in processing

The product placement platform is flexibly movable,offering convenient operation

With an extremely small footprint, it is highly efficient,pollution-free, and has low operating costs

The equipment boasts high stability and is easy to maintain

The dust-proof exterior design meets the requirements of a cleanroom environment

Specification

Machine Size

950(W)*1050(D)*1800(H)mm

Vacuum chamber dimensions

530(W)*450(D)*500(H)mm

Electrode distribution

Non-standard customization

Power supply wattage

1KW

Power supply frequency.

13.56MHz

Software control

PLC touch screen

Loadable gases.

02,N2,Ar



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